Work in progress: aims to identify the purpose of various wafer test patterns, process control monitors (PCM), alignment markers, etc.


Pass condition: concentric

Used to align mask/reticle from layer to layer.


Pass condition: low resistance.

A long wire that should maintain a good electrical signal.


Pass condition: high resistance

Two wires placed close to each other that should not short.

Chain (contact, via)

Pass condition: low resistance

Contact resistance

Four point probe. Two


test_pattern.txt · Last modified: 2013/10/20 10:59 (external edit)
Except where otherwise noted, content on this wiki is licensed under the following license: CC Attribution 4.0 International
Recent changes RSS feed Donate Powered by PHP Valid XHTML 1.0 Valid CSS Driven by DokuWiki