Work in progress: aims to identify the purpose of various wafer test patterns, process control monitors (PCM), alignment markers, etc.

Alignment

Pass condition: concentric

Used to align mask/reticle from layer to layer.

Continuity

Pass condition: low resistance.

A long wire that should maintain a good electrical signal.

Isolation

Pass condition: high resistance

Two wires placed close to each other that should not short.

Chain (contact, via)

Pass condition: low resistance

Contact resistance

Four point probe. Two

References

 
test_pattern.txt · Last modified: 2013/10/20 10:59 (external edit)
 
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