Above: a non-planarized chip before and after lapping
Lapping is more or less the process of using an abrasive on a plate to slowly remove material from a sample. This makes it distinct from polishing in that while polishing also produces smooth surfaces they don't maintain uniform flatness across the entire workpiece. However, the distinctions blur and are often used interchangeably both on this page and in literature.
Within integrated circuit analysis two types of lapping are often employed:
The focus of this article is on parallel polishing and any techniques will refer to that unless otherwise specified. This same process is used to manufacture ICs in a process known as Chemical Mechanical Polishing (CMP). This is a key part of wafer polishing and copper damascene. Furthermore, this focusing on automatic polishing, that is using a machine, rather than manual techinques as they are more repeatable.
Quick overview of typical process: a sample is wax mounted to a stainless steel fixture. The fixture is then put on a spinning disc that is sprayed with a colloidal silica slurry. The sample is occasionally inspected for completion, possibly aided by a micrometer or mechanical setpoint on the polishing fixture.
General advantages:
Disadvantages
[Allied Tech parallel lapping] reccomendations:
Before a fixture is used it should be faced off to ensure that the surface is parallel
For tripod fixtures:
This procedure can also be used to verify that a sample is set reasonaby well by scribbling on it and doing a short polishing cycle
For other fixtures:
If the surface has damage you may consider using fine grit sandpaper first
Above: typical stackup seen on JM machine consisting of (top to bottom):
The first, the poromeric pad is the most important. It is essentially a soft pad to move abrasive around without actually scratching the die. The next forms a smooth surface on which the poromeric pad rests. Finally, the master lap is the interface to the machine itself and has ridges to keep backing plate in plate.
Originally the machine had a steel backed diamond pad directly on the master lap (attached with adhesive, removed with acetone + heatgun). In this setup the steel backing is much stiffer than the polishing pad and so serves as the backing plate.
Asked TedPella about how to use non-PSA pads:
Q: Re: Non-PSA lapping films How are these intended to be attached? I noticed they are lower cost but I don't understand how one would use them. Can you point to an example workflow/setup using them? A: Some polishers have a ring that fits on the disc and holds the lapping film in place. You can also try applying a thin film of water on the disc under the film. If moderate polishing pressure is used this method is satisfactory. For more aggressive polishing, a spray adhesive can be sprayed on the disc. The easiest solution is to use PSA backed film.
Most common is colloidal silica, a suspension of SiO2 in water. Comes in a variety of particle sizes. I (JM) use 0.05 um for everything so that I don't have to clean machine between runs and/or have two machines.
Originally I used MTI “Colloidal Silica (SiO2) Slurry for CMP, 16 Oz/ bottle at 0.05 micron - EQ-MTI-50-CSO” but now am using Ultratec 2397.1 (Blue Non-crystallizing 0.05 um Colloidal Silica) because I can get it in larger size / costs less than half per volume of the MTI at that size.
Ultratec offers solutions in different colors presumably so that you can easily tell 0.03 um solution from 0.05 solution.
To be tested
A buehler representative advised to use a mix 50% Colloidal Silica + 50% Alumina suspension when lapping wafer and die.
Product link: http://www.buehler.co.uk/produits/consommables/polissage-a-loxyde.html
Sample is pressed into it with hot wax on a hotplate [Parallel Lapping of Devices for Deprocessing, Allied Tech parallel lapping] or super glue. There are ridges in the sample holder to help the wax stick. I use “821-3 CrystalbondTM 509 Clear” which seems to work pretty good. I tried a few alternatives like superglue but didn't get very good results (dried too quickly and didn't hold very well). With wax, working time is much longer and holds much better. The heating/cooling cycle does add a little extra time but not too much. It also allows reworking by re-heating the wax if it doesn't set right.
I played a lot with wax thickness. Certainly shouldn't be nearly as thick as the dies but still playing with whats ideal. Thin wax layers (like above) are easy to work with to move the die around without significant wax pooling. However, I've found that slightly thicker wax layers can be advantagous to force a little wax on sacrificial die (see below) edges to help them stick together. This keeps it more planar during pressing and helps prevents dies from separating as the wax is squished.
Above: a non-planar die. The top was higher and thus had more pressure on it and was lapped first
Causes:
Above: a die with rounding. Although its planar its worn a lot more around the edges
There are two issues sacrificial dies can correct:
[Allied Tech parallel lapping] suggests to leave at least 2 mm on each side to prevent rounding. If its something you manufactureed, scribe it as such. However, a RE rarely has that advantage. Instead, place sacrificial dies next to die to decrease rounding (as opposed to far away to increase planarity).
If possible add some blank dies to increase the effective plane size. Use at least three to form a plane, more should be fine. They must be the same thickness and placed evenly apart so that the fixture spins evenly. Probably needs to be within a few um and closer is better. 20 um has been shown to have no effect at all.
Sacrificial dies must be matched very closely in height to the sample. 20 um differences have been observed to have significnat impact (bear in mind a layer is only 1 um). I ordered a high resolution micrometer to help with this (Mitutoyo Digimatic Micrometer 293-761-30). Make sure to clean them well to ensure a good measurement. For actual setting I don't think they have ot be perfectly clean as the wax on both sides should help to even out any small imperfections.
Additionally, if a die is mounted on center it will form rings where the wear is strongest. To fix this mount the die away from the fixture's center of rotation. In my fixture its difficult to mount the die at the center so I haven't run into this problem
In my fixture the carbide fixture pads provide more resistance than the sacrificial dies and so the sizes don't have to be matched very closely. If you mount a large sample you should consider balancing it to keep the spin force even.
If wax gets on top of the dies, I do the following:
Equipment:
Consumables:
Prepare sacrificial dies:
Prepare wax:
Prepare press weight (round):
Steps:
Notes:
After you are done lapping the fixture needs to be prepped for another run. In order from longest time / safest to quickest / most aggressive
Steps when sample must be recovered (patient method, use for important samples):
Steps when sample must be recovered (fast method, typically used):
Steps when recovering sample is less critical (reuses wax, use for throwaway samples):
After sample removal:
Tips:
Above: typical top metal planarity on a *small* (< 2mmx2mm) die. Larger dies give much better results and also tends to get better as more layers are removed
Steps:
Cleanup:
Misc:
It can be important to put in dummy dies to get a nice parallel surface. Useful to know standard wafer thicknesses to purchase blank wafers.
General guidelines:
NOTE: many dies are thinned. See table below for examples of approximate actual die thicknesses
From Wikipedia
Diameter (mm) | Thickness (µm) |
---|---|
25 | N/A |
51 | N/A |
76 | 275 |
100 | 375 |
125/130 | 525 |
150 | 625 |
200 | 675 |
300 | 725 |
450 | 925 |
But how to measure? You can of course very gently measure using dial caliper or micrometer. Alternatively take pre-measured dies and visually inspect to see which its closest to.
Example die thicknesses from JM inventory:
Vendor | Die | Thickness (mm) |
---|---|---|
Xilinx | XC2C32A | 0.32 |
Elpida | dd2516akta | 0.28 |
Fairchild | 74f161a | 0.36 |
hm5216805tt10 | 0.32 | |
hy57v658020b | 0.32 | |
hyb39s64800ct-8 | 0.38 | |
Harris | 80C86 | 0.48 |
htl | ht33s328256k | 0.27 |
mt46v16m8 | 0.31 | |
mt 48 lc16ma2 | 0.29 | |
mt 48lc 16m8a2 tg-75 | 0.30 | |
mt 48 lc2m8a1 tg-8b | 0.31 | |
oki | m56vi6800d-10 | 0.28 |
phillips | hef4052bt | 0.38 |
siemens | hyb39s16 | 0.38 |
samsung | k4h560838c | 0.36 |
sst | mpf 39vf010 | 0.66 |
ti | 68f483k e4 | 0.26 |
vg264265bj | 0.43 |
This is mostly dies I have a bunch of such that they'd be candidates as blanks during lapping. This biases it mostly towards chips I scrapped out of RAM
Process analysis cuts dies at right angles. These are typically small stainless clamps that hold the die against the wheel with precise angle adjustment.
Flylogic uses both it and wet etching. As lapping through the SiO2 can take a while this significantly reduces processing time. They also use the finger method leading to non-planar laps. However, as they are only looking at specific chip areas this is acceptable as it tends to be flat enough over the area of interest.
My guess is that wet etching away the overglass could help reduce some lapping defects and could prove effective in combination with some lapping fixtures
[Allied Tech parallel lapping] general reccomendations if not polishing evenly:
Suggestions:
Suggestions:
Suggestions:
Without using a machine or jig, its possible to simply rub a die against a pad soaked in CMP solution. I did this before I got a machine and it worked to get some basic polishing results but is very labor intensive.
Slightly a step up is to use a machine without a jig. Some notes: tutorial
900 g Al round block
Removing pads