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decap:rie [2013/10/20 10:59] external edit
decap:rie [2013/11/23 01:19] (current)
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-Reactive Ion Etching (RIE) uses radio waves and an etchant gas to etch away a sample. ​ Unlike many chemical methods, RIE is isotrophic making it suitable ​for etching high resolution lithography. ​ As an analyst tool it provides a good way to both delayer ​and even decapsulation chips, although it tends to be much slower than alternative methods.+Mainly this is used for delayering ([[delayer:rie|main article]]) but sometimes used to remove epoxy.
-A typical RIE setup (an "​asher"​) has a bottle of gas such as SF6 fed into a quartz tube with a sample in it.  The quartz tube is surrounded by magnetic coils emitting typically 13.56 MHz radio waves. 
decap/rie.txt ยท Last modified: 2013/11/23 01:19 by mcmaster
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