This is an old revision of the document!


Reactive Ion Etching (RIE) uses radio waves and an etchant gas to etch away a sample. Unlike many chemical methods, RIE is isotrophic making it suitable for etching high resolution lithography. As an analyst tool it provides a good way to both delayer and even decapsulation chips, although it tends to be much slower than alternative methods.

A typical RIE setup (an “asher”) has a bottle of gas such as SF6 fed into a quartz tube with a sample in it. The quartz tube is surrounded by magnetic coils emitting typically 13.56 MHz radio waves.

 
decap/rie.1382281148.txt.gz · Last modified: 2013/11/23 06:19 (external edit)
 
Except where otherwise noted, content on this wiki is licensed under the following license: CC Attribution 4.0 International
Recent changes RSS feed Donate Powered by PHP Valid XHTML 1.0 Valid CSS Driven by DokuWiki