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— | test_pattern [2012/02/20 09:45] – created mcmaster | ||
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+ | Work in progress: aims to identify the purpose of various wafer test patterns, process control monitors (PCM), alignment markers, etc. | ||
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+ | ====== Alignment ====== | ||
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+ | {{gallery> | ||
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+ | Pass condition: concentric | ||
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+ | Used to align mask/ | ||
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+ | ====== Continuity ====== | ||
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+ | Pass condition: low resistance. | ||
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+ | A long wire that should maintain a good electrical signal. | ||
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+ | ====== Isolation ====== | ||
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+ | Pass condition: high resistance | ||
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+ | Two wires placed close to each other that should not short. | ||
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+ | ====== Chain (contact, via) ====== | ||
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+ | {{gallery> | ||
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+ | {{gallery> | ||
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+ | {{gallery> | ||
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+ | {{gallery> | ||
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+ | Pass condition: low resistance | ||
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+ | ====== Contact resistance ====== | ||
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+ | Four point probe. Two | ||
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+ | ====== References ====== | ||
+ | * [[http:// | ||
+ | * [[http:// | ||
+ | * http:// | ||
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