Protects the underlying circuits. Seems to be omitted on rare occasions or more likely at least something that decapsulation chemicals attack. When still on the chip it gives a cloudy feeling and should be removed for best results. Example of damaged passivation showing difference in image quality:
When the passivation is in good condition it can be difficult to discern if its still present. Also called overglass since its often made of SiO2.
See main article
Tensile stress enhances electron mobility and compressive stress enhances hole mobility. [Kaeslin] Can be incorporated with the following:
Does not seem that this is common and is only seen in very high performance ICs.
Any component that makes up the layers on the die. Gets its name since the components are made by shining light through a photomask. Example photomask:
Actual photomasks only are for a single layer at a time.
Manufacturers typically label dies with an internal chip number and often the manufacturer. Often these are all placed together (if present), but not necessarily.
Makes up interconnect layers.
Above example shows an L shaped interconnect used to jumper over an area. The vias are the dots on the ends. Vias seem to usually be made of copper.
[Kaeslin] provides some good information: -“Historical sink-in via”: hole in dielectric is simply deposited in a layer that fills the hole -Plugged via: tungsten “plug” forms the via and goes between two metal layers mostly filled with a dielectric -Fabs usually only accept a single size via -Stipple contact/via: array of vias since often only one size via is allowed -“Electromigration-aware stipple contact/via”?
Connects transistor pieces together and often other metal layers. Typically aluminium and occasionally copper on upper layers of high performance chips.
Connections between metal layers and the transistors. Typically made of copper in modern dies, but earlier dies used aluminium.
The active part of the die. Depending on the process technology, these will be formed in various ways. They are the lowest interesting layer.
The majority of the mass of the die. Usually just a large block of silicon. The surface of a CMOS wafer is typically oriented along the <100> direction, many bipolar devices use <111>. <110> wafers are usually only seen in specialized applications such as MEMS.
Generally fairly boring and not much worth noting.