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--- decap:rie [2012/05/30 04:59] – created mcmaster
+++ decap:rie [2013/11/23 06:19] (current) – mcmaster
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-Reactive Ion Etching (RIE) uses radio waves and an etchant gas to etch away a sample.  Unlike many chemical methods, RIE is isotrophic making it suitable for etching high resolution lithography.  As an analyst tool it provides a good way to both delayer and even decapsulation chips, although it tends to be much slower than alternative methods.
+Mainly this is used for delayering ([[delayer:rie|main article]]) but sometimes used to remove epoxy.
-A typical RIE setup (an "asher") has a bottle of gas such as SF6 fed into a quartz tube with a sample in it.  The quartz tube is surrounded by magnetic coils emitting typically 13.56 MHz radio waves.