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Package





Die


Step Notes
mz 1) Laser back off
2) HCl + 12% H2O2 15 min, 90C
3) WFNA, 10 min
s1-1 48% HF, 11 min, 25C
s1-2 Barrier etch (4.5 mL 35% H2O2, 1 mL NH4OH), 3 min, 90C
s1-3 48% HF, 10 min, 25C
s1-4 1 mL 48% HF, 1 mL H3PO4, 1 mL H2SO4, 30 min, 90C

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mz_mit20x

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s1-1_mit20x

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s1-2_mit20x

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s1-3_mit20x

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s1-4_mit20x

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s1-4_vc60x_roi01-ram

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s1-4_vc60x_roi03-cells

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