mcmaster:cypress:cy7c68013a-56ltxc
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| mcmaster:cypress:cy7c68013a-56ltxc [2025/03/20 02:09] – mcmaster | mcmaster:cypress:cy7c68013a-56ltxc [2025/08/04 21:23] (current) – external edit 127.0.0.1 | ||
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| - | ^ Step ^ Notes ^ | + | ^ Step ^ Notes ^ | 
| - | | s1-1 | 48% HF, 11 min, 25C | | + | | mz | 1) Laser back off\\ 2) HCl + 12% H2O2 15 min, 90C\\ 3) WFNA, 10 min | | 
| - | | s1-2 | Barrier etch (4.5 mL 35% H2O2, 1 mL NH4OH), | + | | s1-1 | 48% HF, 11 min, 25C | | 
| - | | s1-3 | 48% HF, TBD, 25C | | + | | s1-2  | Barrier etch (4.5 mL 35% H2O2, 1 mL NH4OH), | 
| + | | s1-3 | 48% HF, 10 min, 25C | | ||
| + | | s1-4 | 1 mL 48% HF, 1 mL H3PO4, 1 mL H2SO4, 30 min, 90C | | ||
| - | {{https://siliconpr0n.org/ | + | {{https://siliconprawn.org/ | 
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mcmaster/cypress/cy7c68013a-56ltxc.1742436598.txt.gz · Last modified: 2025/03/20 02:09 by mcmaster
                
                