conventions
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| conventions [2020/05/11 03:53] – [Table] mcmaster | conventions [2025/08/04 21:23] (current) – external edit 127.0.0.1 | ||
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| * For others, see below | * For others, see below | ||
| - | mcmaster: I've been calling intermediate etchings in more complex processes like s3-7 meaning sample 3, processing step 7. This avoids spending too much time trying to classify something that isn't really a purely poly or active | + | mcmaster: |
| + | * I've been calling intermediate etchings in more complex processes like s3-7 meaning sample 3, processing step 7 | ||
| + | * This avoids spending too much time trying to classify something that isn't really a purely poly or active | ||
| Conventions: | Conventions: | ||
| Line 31: | Line 33: | ||
| * st_24c02_mz_ns50xu.jpg: | * st_24c02_mz_ns50xu.jpg: | ||
| * st_24c02_mz.jpg: | * st_24c02_mz.jpg: | ||
| + | * Complex example | ||
| + | * ti_tms32010c-70015_s1-2_mit20x_rom.jpg | ||
| + | * Vendor: Texas Instruments (ti) | ||
| + | * Chip: TMS32010C | ||
| + | * Chip variant: 70015 (in this case the ROM programming) | ||
| + | * s1-2: sample 1, processing step 2. Please list processing steps on wiki page if available | ||
| + | * mit20x: objective used | ||
| + | * rom: a region of interest within the 20x scan | ||
| * wafer example | * wafer example | ||
| - | * mos_8564r6-wafer_mz.jpg: a MOS 8564R6 wafer top metal. Main chip | + | * mos_8564r6-wafer_mz_die.jpg: a MOS 8564R6 wafer top metal. Main chip |
| - | * mos_8564r6-wafer_mz-9079r2_mz.jpg: a MOS 8564R6 wafer top metal, but the test pattern 9079R2 | + | * mos_8564r6-wafer_mz_9079r2.jpg: a MOS 8564R6 wafer top metal, but the test pattern 9079R2 |
| ===== Technique ===== | ===== Technique ===== | ||
| Line 67: | Line 77: | ||
| * am100x: AmScope 100x (oil immersion) | * am100x: AmScope 100x (oil immersion) | ||
| * bli20x: Bausch & Lomb industrial 20x (designed for stereozoom series) | * bli20x: Bausch & Lomb industrial 20x (designed for stereozoom series) | ||
| + | * boli10xir: Boli Optics M Plan Apo 10x NIR (comparable to Mitsutoyo) | ||
| * ch2x: cheap supposedly Apo 2x objective that may be made of soda glass (green tinge…). | * ch2x: cheap supposedly Apo 2x objective that may be made of soda glass (green tinge…). | ||
| * mit5x: Mitutoyo M Plan Apo 5x | * mit5x: Mitutoyo M Plan Apo 5x | ||
| Line 73: | Line 84: | ||
| * mit50xn: Mitutoyo M Plan Apo 50x Near UV | * mit50xn: Mitutoyo M Plan Apo 50x Near UV | ||
| * mit100x: Mitutoyo M Plan Apo 100x | * mit100x: Mitutoyo M Plan Apo 100x | ||
| + | * nikon20x: Nikon M Plan 20x ELWD | ||
| * neo5x: Olympus Neo 5x | * neo5x: Olympus Neo 5x | ||
| * nd5x: Olympus Neo DPlan 5x | * nd5x: Olympus Neo DPlan 5x | ||
| * ns50x: Olympus Neo SPlan 50x | * ns50x: Olympus Neo SPlan 50x | ||
| * ns50xu: Olympus Neo SPlan 50x ultra-long working distance (ULWD) | * ns50xu: Olympus Neo SPlan 50x ultra-long working distance (ULWD) | ||
| + | * md5x: Olympus MDPlan 5x | ||
| + | * ms10x: Olympus MSPlan 10x | ||
| + | * ms20x: Olympus MSPlan 20x | ||
| + | * ms50x: Olympus MSPlan 50x | ||
| + | * ms100x: Olympus MSPlan 100x | ||
| + | * opl100x: Olympus Plan 100x Oil 1.25NA | ||
| + | * oplcn100x: Olympus Plan CN 100x Oil 1.25NA | ||
| * sz or zoom: Zoom microscope, generally no scale bar provided because magnification varies (unless that particular zoom setting was calibrated during the same imaging session) | * sz or zoom: Zoom microscope, generally no scale bar provided because magnification varies (unless that particular zoom setting was calibrated during the same imaging session) | ||
| - | |||
| - | Scales | ||
| - | |||
| - | ^ Scope ^ Objective | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| - | | pr0nscope | ||
| See also | See also | ||
conventions.1589169209.txt.gz · Last modified: 2020/05/11 03:53 by mcmaster