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test_pattern [2013/10/20 10:59] (current)
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 +Work in progress: aims to identify the purpose of various wafer test patterns, process control monitors (PCM), alignment markers, etc.
 +
 +====== Alignment ====== ​
 +
 +{{gallery>​image:​test_patterns.jpg}}
 +
 +Pass condition: concentric
 +
 +Used to align mask/​reticle from layer to layer.
 +
 +====== Continuity ====== ​
 +
 +Pass condition: low resistance.
 +
 +A long wire that should maintain a good electrical signal.
 +
 +====== Isolation ====== ​
 +
 +Pass condition: high resistance
 +
 +Two wires placed close to each other that should not short.
 +
 +====== Chain (contact, via) ====== ​
 +
 +{{gallery>​image:​john_mcmaster_ibm_043641wkaa_pattern_regular_64.jpg}}
 +
 +{{gallery>​image:​john_mcmaster_ibm_043641wkaa_pattern_regular_68.jpg}}
 +
 +{{gallery>​image:​john_mcmaster_ibm_043641wkaa_pattern_regular_61.jpg}}
 +
 +{{gallery>​image:​john_mcmaster_ibm_043641wkaa_pattern_regular_18_0.jpg}}
 +
 +Pass condition: low resistance
 +
 +====== Contact resistance ====== ​
 +
 +Four point probe. Two
 +
 +====== References ====== ​
 +  * [[http://​www.patentgenius.com/​patent/​6841890.html]]
 +  * [[http://​cleanroom.byu.edu/​alignment.phtml]]
 +  * http://​www.stanford.edu/​class/​ee410/​TestStructures.pdf
 +
  
 
test_pattern.txt ยท Last modified: 2013/10/20 10:59 (external edit)
 
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