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+Work in progress: aims to identify the purpose of various wafer test patterns, process control monitors (PCM), alignment markers, etc.
+====== Alignment ======
+{{gallery>image:test_patterns.jpg}}
+Pass condition: concentric
+Used to align mask/reticle from layer to layer.
+====== Continuity ======
+Pass condition: low resistance.
+A long wire that should maintain a good electrical signal.
+====== Isolation ======
+Pass condition: high resistance
+Two wires placed close to each other that should not short.
+====== Chain (contact, via) ======
+{{gallery>image:john_mcmaster_ibm_043641wkaa_pattern_regular_64.jpg}}
+{{gallery>image:john_mcmaster_ibm_043641wkaa_pattern_regular_68.jpg}}
+{{gallery>image:john_mcmaster_ibm_043641wkaa_pattern_regular_61.jpg}}
+{{gallery>image:john_mcmaster_ibm_043641wkaa_pattern_regular_18_0.jpg}}
+Pass condition: low resistance
+====== Contact resistance ======
+Four point probe. Two
+====== References ======
+  * [[http://www.patentgenius.com/patent/6841890.html]]
+  * [[http://cleanroom.byu.edu/alignment.phtml]]
+  * http://www.stanford.edu/class/ee410/TestStructures.pdf